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Science and Engineery of Materials and Processes

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PREMS plateform

Experimental facilities for research on synthesis of architected thin films

The PREMS platform includes 2 High temperature CVD reactors, 2 Atomic Layer Deposition reactor and 1 reactor dedicated to in-situ studies.

Plateforme PREMS 2016

Permanent staff: Elisabeth BLANQUET, Raphaël BOICHOT, Alexandre CRISCI, Arnaud MANTOUX, Frédéric MERCIER, Magali MORAIS,  Roman REBOUD, Michel PONS.
 

In-situ CVD/ALD Stuart reactor:

Homemade cold-wall reactor (stainless steel chamber) for optical study of growth and annealing (stress, growth rate, reflectance, Raman, ellipsometry). Working temperature up to 1100°C for a maximum size for samples of 15 mm. Gas lines: NH3,H2, Ar,N2, C3H8, Cl2, SiH4. 2 lines for solid or liquid precursors. In-situ chlorination of metals for deposition of corresponding nitride or carbide.
Example of materials synthesized/annealed : Al2O3,AlN, SiC, VO2,Y2O3:Eu
A few images of its manufacture ...
Stuart
In-situ CVD/ALD Stuart Reactor
 

ALD Pico 1.0 reactor :

PEALD reactor form Picosun (R-200). Hot-wall reactor for synthesis of nanometric layers (in the range 1-200 nm) of metals, oxides and nitrides. Working temperature up to 500°C for a maximum size for samples of 20x20x15cm. Both thermal (N2O,NH3,O2,H2,Ar) and plasma (O2,H2)modes . 3 lines for solid or liquid precursors. Possibility to use ex-situ plasma cleaner.
Example of materials synthesized : TiN,AlN,NbN,TiO2,Al2O3
 ALD Pico 1.0 Reactor
 

ALD Nano 2.0 reactor

Homemade cold-wall reactor for synthesis of nanometric layers (in the range 1-200 nm) of oxides and nitrides. Working temperature up to 700°C for a maximum size for samples of 2 inches. Thermal mode (N2O,NH3,H2,Ar). 3 lines for solid or liquid precursors. Possibility to use ex-situ plasma cleaner.
Example of materials synthesized : TiN,AlN,NbN,TiO2,Al2O3
ALD Nano 2.0 Reactor
 

CVD Belledonne reactor :

Homemade cold-wall reactor (quartz tube) for synthesis of thin to thick layers (20nm-20 µm) of nitrides and silicides, from polycrystalline to single crystalline layers. Working temperature up to 1700°C for a maximum size for samples of 2 inches. Gas lines: NH3, H2, Ar, Cl2, SiH4, N2. 1 line for solid or liquid precursors. In-situ chlorination of metals (up to 2) for deposition of corresponding nitride or carbide.
Example of materials synthesized : TiN, AlN, TiAlN, NbN, NbTiN, Si, CrSi2
CVD Belledonne Reactor
 

CVD Chartreuse reactor:

Homemade cold-wall reactor (quartz tube) for synthesis of thin to thick layers (20nm-20 µm) of nitrides, carbides and silicides, from polycrystalline to single crystalline layers. Working temperature up to 1700°C for a maximum size for samples of 4 inches. Gas lines: NH3, H2, Ar, Cl2, SiH4, N2, C3H8. 1 line for solid or liquid precursors. In-situ chlorination of metals for deposition of corresponding nitride or carbide.
Example of materials synthesized : TiN, AlN, TiAlN, NbN, NbTiN, Si, CrSi2
CVD Chartreuse Reactor

Date of update December 9, 2019

Université Grenoble Alpes